EUV looking to 225wph

Author: EIS Release Date: Aug 10, 2020


At last month’s Imec Technology Conference, ASML’s CEO Martin van den Brink  revealed that the company has a route to get EUV to 225 wph while the productivity of immersion lithography has doubled over the last nine years.

11 million EUV wafers have been  exposed and 57 3400x EUV systems have been shipped, said van den Brink.

itf usa 2020 martin van den brink Page 20 imec virtual technology

ASML is increasing wafer throughput while reducing energy per wafer.

With a 30mj/cm2 dose ASML expects to get throughput of 225 wph with the NXE3800 system.